PDF Ebook Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience
By seeing this page, you have done the right gazing point. This is your begin to choose guide Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience that you want. There are whole lots of referred books to review. When you wish to get this Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience as your publication reading, you can click the web link page to download and install Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience In few time, you have owned your referred e-books as yours.
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience
PDF Ebook Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience
How if there is a website that enables you to search for referred publication Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience from throughout the globe publisher? Instantly, the site will certainly be amazing finished. Many book collections can be discovered. All will be so simple without difficult point to relocate from website to site to obtain guide Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience desired. This is the site that will certainly give you those requirements. By following this site you can acquire whole lots numbers of publication Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience collections from variations types of writer and also author preferred in this world. Guide such as Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience as well as others can be gotten by clicking nice on web link download.
However, exactly what's your concern not too loved reading Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience It is an excellent task that will consistently provide fantastic advantages. Why you come to be so odd of it? Many things can be practical why individuals don't want to check out Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience It can be the monotonous tasks, guide Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience compilations to check out, also careless to bring spaces anywhere. Now, for this Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience, you will start to love reading. Why? Do you know why? Read this page by finished.
Beginning with seeing this website, you have attempted to begin caring reviewing a publication Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience This is specialized site that offer hundreds collections of publications Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience from whole lots resources. So, you will not be tired anymore to choose guide. Besides, if you likewise have no time at all to browse the book Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience, simply sit when you remain in workplace and also open up the browser. You could locate this Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience inn this web site by connecting to the web.
Get the connect to download this Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience and begin downloading and install. You could really want the download soft file of the book Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience by going through other tasks. Which's all done. Now, your turn to review a book is not consistently taking and bring the book Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience anywhere you go. You could conserve the soft documents in your device that will certainly never ever be far away and review it as you like. It resembles checking out story tale from your gizmo after that. Now, start to like reading Microelectronic Applications Of Chemical Mechanical PlanarizationFrom Wiley-Interscience and get your brand-new life!
An authoritative, systematic, and comprehensive description of current CMP technology
Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization:
*
Provides in-depth coverage of a wide range of state-of-the-art technologies and applications
*
Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips
*
Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP
*
Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP
*
Provides a perspective on the opportunities and challenges of the next fifteen years
Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.
- Sales Rank: #2534387 in Books
- Published on: 2007-10-19
- Original language: English
- Number of items: 1
- Dimensions: 9.50" h x 1.63" w x 6.40" l, 2.63 pounds
- Binding: Hardcover
- 734 pages
From the Back Cover
An authoritative, systematic, and comprehensive description of current CMP technology
Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer hard drive manufacturing. This reference focuses on the chemical aspects of the technology and includes contributions from the foremost experts on specific applications. After a detailed overview of the fundamentals and basic science of CMP, Microelectronic Applications of Chemical Mechanical Planarization:
-
Provides in-depth coverage of a wide range of state-of-the-art technologies and applications
-
Presents information on new designs, capabilities, and emerging technologies, including topics like CMP with nanomaterials and 3D chips
-
Discusses different types of CMP tools, pads for IC CMP, modeling, and the applicability of tribometrology to various aspects of CMP
-
Covers nanotopography, CMP performance and defect profiles, CMP waste treatment, and the chemistry and colloidal properties of the slurries used in CMP
-
Provides a perspective on the opportunities and challenges of the next fifteen years
Complete with case studies, this is a valuable, hands-on resource for professionals, including process engineers, equipment engineers, formulation chemists, IC manufacturers, and others. With systematic organization and questions at the end of each chapter to facilitate learning, it is an ideal introduction to CMP and an excellent text for students in advanced graduate courses that cover CMP or related semiconductor manufacturing processes.
About the Author
Yuzhuo Li is a tenured professor in the Department of Chemistry and a member of the Center for Advanced Materials Processing (CAMP) at Clarkson University in Potsdam, New York. He is a member of the American Chemical Society, Chinese American Chemical Society, Materials Research Society, and The Electrochemical Society. He also holds guest professorships at several Chinese universities, including Yangzhou University and Sun Yat-Sen University.
Most helpful customer reviews
2 of 3 people found the following review helpful.
Enjoy & Feel CMP thoroughly.
By Sung Pyo Jung
This book is written with very deep insightful views for CMP. I am very happy to share CMP experiments/journey with these authors in the book. This book has a little different view compared to the previous CMP books. However, you will definately enjoy it. Thanks.
0 of 0 people found the following review helpful.
Good CMP book.
By Bing Hu
I am a new graduated college student and just found a CMP engineer position. This book is good for starter to learn CMP. But it doesn't talk too much scientific mechanism. It is still a good book for CMP engineer to keep.
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience PDF
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience EPub
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience Doc
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience iBooks
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience rtf
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience Mobipocket
Microelectronic Applications of Chemical Mechanical PlanarizationFrom Wiley-Interscience Kindle
Tidak ada komentar:
Posting Komentar